Manufacturing Engineering & Technology
Manufacturing Engineering & Technology
7th Edition
ISBN: 9780133128741
Author: Serope Kalpakjian, Steven Schmid
Publisher: Prentice Hall
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Chapter 28, Problem 30QTP
To determine

A chlorine-based polysilicon etching process displays a polysilicon-to-resist selectivity of 5:1 and a polysilicon-to oxide selectivity of 60:1 . Estimate the amount of resist and exposed oxide will be consumed in etching  3500 of poly silicon. Determine the poly silicon-to-oxide selectivity have to be in order to reduce the loss to only 40A0 of exposed oxide.

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For a given 40 cm diameter wafer, and a die that is 1.5 cm x 2 cm, determine the cost of a die. Wafer cost is $5800, wafer yield is 100%, and defects per unit area is 0.09/sq. cm.
Write in detail following terminologies according to wafer fabrication processes: a. Diffusion and Ion Implantation b. Metallization c. Etching
A siilicon boule has been processed through grinding to provide a cylinder whose diameter  = 281 mm and whose length = 899 mm. Next, it will be sliced into wafers 0.8 mm thick using a cut-off saw with a kerf = 0.5 mm. The wafer thus produced will be used to fabricate as many IC chips as possible for the personal computer market. Each IC has a market value to the company of $108. Each chip is square with 17 mm on a side. The processable area of each wafer is defined by a diameter = 265 mm. Estimate the value of all of the IC chips that could be produced (in $), asssuming an overall yield of 84% good product.

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Manufacturing Engineering & Technology

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