A boron implant at 30 keV is done through a gate oxide that is 15nm thick, into a silicon substrate. LSS tables show a boron implant range in oxide at this energy of 100 nm and a standard deviation of 25 nm. Calculate the fraction of boron implant that is absorbed in the oxide.

Understanding Motor Controls
4th Edition
ISBN:9781337798686
Author:Stephen L. Herman
Publisher:Stephen L. Herman
Chapter17: Temperature Sensing Devices
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Problem 14RQ: Assume that a silicon diode is being used as a temperature detector. If its temperature increases,...
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A boron implant at 30 keV is done through a gate oxide that is 15nm thick, into a silicon substrate. LSS tables show a boron implant range in oxide at this energy of 100 nm and a standard deviation of 25 nm. Calculate the fraction of boron implant that is absorbed in the oxide.
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