Consider a p-type silicon wafer doped with 1.3 × 1016 cm-3 acceptors. Assuming a temperature of 300 K: Calculate the minority carrier concentration in the bulk regions on each side of the resulting pn junction.

Gallium arsenide is doped at room temperature with acceptor impurity atoms at a concentration of 10¹6 cm-³. a) Find the concentration of electrons and holes. b) Is the semiconductor n-type or p-type?

You have a semiconductor layer of GaAs that is doped with acceptors to a level of 1x1023 m-3. The band-gap energy of GaAs is 1.42 eV and the intrinsic carrier concentration (hi) at 300K is 2x1012 m-3. Some of the following statements regarding this semiconductor are TRUE and some are FALSE. i. At 300K the semiconductor has 1x1023 m-3 holes. ii. At 300K the semiconductor has 1x1023 m-3 electrons. iii. The minority carrier type in this semiconductor is electrons. iv. The minority carrier type in this semiconductor is holes. v. The electron concentration at 300K in this semiconductor is 2x1012 m-3. vi. The electron concentration at 300K in this semiconductor is 2x1035 m-3. vii. Increasing the temperature to 400K will cause the acceptor concentration to increase. viii. Increasing the temperature to 400K will cause the intrinsic carrier concentration to increase. Which of the following statements is correct: (ii) and (viii) are FALSE (iii) and (v) are FALSE (v) and (viii) are FALSE (v) and…

Hole mobility...