Concept explainers
Interpretation:
Explanation should be given for using SiO2 as a mask instead of the fact that it will react with the etchant.
Concept introduction:
Microfabrication is a process through which nearly all the semiconductor type materials and circuits are fabricated. The microfabricated devices are formed over the substrate surface with one or more thin films. In most of the devices, silicon wafers are generally used as substrate.
The insertion of desirable pattern is done through masking in which a certain portion of the film is detected which is to be removed for insertion.
Etching is the process of removing a small portion of that thin film or substrate from the device.
This etching can be of two types; dry etching (plasma etching) or wet etching (chemical etching).
Want to see the full answer?
Check out a sample textbook solutionChapter 8 Solutions
Chemistry for Engineering Students
- Sketch the structure of a 1:1 and 2:1 layer silicates.arrow_forwardWhat volume of sulfur dioxide at 25ᵒCand 1 atm pressure is produced when one boxcarload ( 4 x 10^3 cu.ft) of chalcopyrite ore (density =2.6 g/cu.cm) is roasted? Assume all the sulfur inthe ore is converted to SO2 and no other source ofsulfur is present.arrow_forwardSilicon carbide (SiC) is made by the high-temperature reaction of silica sand (quartz) with coke; the byproduct is carbon monoxide.(a) Write a balanced chemical equation for this reaction.(b) Calculate the standard enthalpy change per mole of SiC produced.(c) Predict (qualitatively) the following physical properties of silicon carbide: conductivity, melting point, and hardness.arrow_forward
- General Chemistry - Standalone book (MindTap Cour...ChemistryISBN:9781305580343Author:Steven D. Gammon, Ebbing, Darrell Ebbing, Steven D., Darrell; Gammon, Darrell Ebbing; Steven D. Gammon, Darrell D.; Gammon, Ebbing; Steven D. Gammon; DarrellPublisher:Cengage LearningChemistry & Chemical ReactivityChemistryISBN:9781133949640Author:John C. Kotz, Paul M. Treichel, John Townsend, David TreichelPublisher:Cengage LearningChemistry & Chemical ReactivityChemistryISBN:9781337399074Author:John C. Kotz, Paul M. Treichel, John Townsend, David TreichelPublisher:Cengage Learning
- Principles of Modern ChemistryChemistryISBN:9781305079113Author:David W. Oxtoby, H. Pat Gillis, Laurie J. ButlerPublisher:Cengage LearningChemistry: The Molecular ScienceChemistryISBN:9781285199047Author:John W. Moore, Conrad L. StanitskiPublisher:Cengage LearningChemistry: Principles and ReactionsChemistryISBN:9781305079373Author:William L. Masterton, Cecile N. HurleyPublisher:Cengage Learning