The standard deviation of critical dimension thickness in semiconductor manufacturing is a = 15 nm. (a) State the null and alternative hypotheses used to demonstrate that the standard deviation is reduced. (b) Assume that the previous test does not reject the null hypothesis. Does this result provide strong evidence that the standard deviation has not been reduced? (a) Ho: 0= 1 (b) .H₂:0

Calculus For The Life Sciences
2nd Edition
ISBN:9780321964038
Author:GREENWELL, Raymond N., RITCHEY, Nathan P., Lial, Margaret L.
Publisher:GREENWELL, Raymond N., RITCHEY, Nathan P., Lial, Margaret L.
Chapter13: Probability And Calculus
Section13.3: Special Probability Density Functions
Problem 30E
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The standard deviation of critical dimension thickness in semiconductor manufacturing is o = 15 nm.
(a) State the null and alternative hypotheses used to demonstrate that the standard deviation is reduced.
(b) Assume that the previous test does not reject the null hypothesis. Does this result provide strong evidence that the standard
deviation has not been reduced?
(a) Ho: 0 = i
(b)
.H₂:0
Transcribed Image Text:The standard deviation of critical dimension thickness in semiconductor manufacturing is o = 15 nm. (a) State the null and alternative hypotheses used to demonstrate that the standard deviation is reduced. (b) Assume that the previous test does not reject the null hypothesis. Does this result provide strong evidence that the standard deviation has not been reduced? (a) Ho: 0 = i (b) .H₂:0
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