The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2050 and 0.2150 micrometers. a. Determine the cumulative distribution function of photoresist thickness. b. Determine the proportion of wafers that exceeds 0.2125 micrometers in photoresist thickness. c. What thickness is exceeded by 10% of the wafers? d. Determine the mean and variance of photoresist thickness.

The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2050 and 0.2150 micrometers. a. Determine the cumulative distribution function of photoresist thickness. b. Determine the proportion of wafers that exceeds 0.2125 micrometers in photoresist thickness. c. What thickness is exceeded by 10% of the wafers? d. Determine the mean and variance of photoresist thickness.

Materials Science And Engineering Properties

1st Edition

ISBN:9781111988609

Author:Charles Gilmore

Publisher:Charles Gilmore

Chapter15: Experimental Methods

Section: Chapter Questions

Problem 15ETSQ

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