MATLAB: An Introduction with Applications
MATLAB: An Introduction with Applications
6th Edition
ISBN: 9781119256830
Author: Amos Gilat
Publisher: John Wiley & Sons Inc
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In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and
D. W. Jillie describe an experiment to determine the effect of C₂F6 flow rate on the uniformity of the etch on a silicon wafer used in
integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six
replicates is shown below.
C₂F6 Flow
(SCCM)
There is
125
160
200
Observations
1 2
3
4 5 6
2.7 4.7 2.7 3.0 3.1 3.7
4.9 4.6 4.9 4.1 3.7 4.3
4.5 3.3 3.0 3.5 4.2 5.1
(a) Does C₂F6 flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance.
Use α =
0.05.
that flow rate affects etch uniformity.
(b) Do the residuals indicate any problems with the underlying assumptions?
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Transcribed Image Text:In "Orthogonal Design for Process Optimization and Its Application to Plasma Etching" (Solid State Technology, May 1987), G. Z. Yin and D. W. Jillie describe an experiment to determine the effect of C₂F6 flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Three flow rates are used in the experiment, and the resulting uniformity (in percent) for six replicates is shown below. C₂F6 Flow (SCCM) There is 125 160 200 Observations 1 2 3 4 5 6 2.7 4.7 2.7 3.0 3.1 3.7 4.9 4.6 4.9 4.1 3.7 4.3 4.5 3.3 3.0 3.5 4.2 5.1 (a) Does C₂F6 flow rate affect etch uniformity? Construct box plots to compare the factor levels and perform the analysis of variance. Use α = 0.05. that flow rate affects etch uniformity. (b) Do the residuals indicate any problems with the underlying assumptions?
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