EXAMPLE Consider the plasma etching experiment Recall that the engineer is interested in determining if the RF power setting affects the etch rate, and she has run a completely randomized exper- iment with four levels of RF power and five replicates. For convenience, we repeat here the data from Table 3.1: RF Power Observed Etch Rate (A/min) (W) 3 4. 160 575 542 530 539 570 180 565 593 590 579 610 200 600 651 610 637 629 220 725 700 715 685 710 consider = H + H2-H3- H4 test the hypothesis that the contrast I differs significantly from zero. Dr. Asleb Abtahi - Faculty of Mathematics and Statistics islamic Azad University of Shira2 Iran

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Chapter1: Combinatorial Analysis
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EXAMPLE
Consider the plasma etching experiment Recall that the engineer is
interested in determining if the RF power setting affects the
etch rate, and she has run a completely randomized exper-
iment with four levels of RF power and five replicates. For
convenience, we repeat here the data from Table 3.1:
RF Power
Observed Etch Rate (A/min)
(W)
160
575
542
530
539
570
180
565
593
590
579
610
200
600
651
610
637
629
220
725
700
715
685
710
consider r, = H + H2- H3 - 4
test the hypothesis that the contrast I1 differs significantly from zero.
Dr. Asieh Abtahi - Faculty of Mathematics and Statistics
Islamic Azad University of Shiraz - Iran
Transcribed Image Text:EXAMPLE Consider the plasma etching experiment Recall that the engineer is interested in determining if the RF power setting affects the etch rate, and she has run a completely randomized exper- iment with four levels of RF power and five replicates. For convenience, we repeat here the data from Table 3.1: RF Power Observed Etch Rate (A/min) (W) 160 575 542 530 539 570 180 565 593 590 579 610 200 600 651 610 637 629 220 725 700 715 685 710 consider r, = H + H2- H3 - 4 test the hypothesis that the contrast I1 differs significantly from zero. Dr. Asieh Abtahi - Faculty of Mathematics and Statistics Islamic Azad University of Shiraz - Iran
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