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EXAMPLE Consider the plasma etching experiment Recall that the engineer is interested in determining if the RF power setting affects the etch rate, and she has run a completely randomized exper- iment with four levels of RF power and five replicates. For convenience, we repeat here the data from Table 3.1: RF Power Observed Etch Rate (A/min) (W) 3 4. 160 575 542 530 539 570 180 565 593 590 579 610 200 600 651 610 637 629 220 725 700 715 685 710 consider = H + H2-H3- H4 test the hypothesis that the contrast I differs significantly from zero. Dr. Asleb Abtahi - Faculty of Mathematics and Statistics islamic Azad University of Shira2 Iran

EXAMPLE Consider the plasma etching experiment Recall that the engineer is interested in determining if the RF power setting affects the etch rate, and she has run a completely randomized exper- iment with four levels of RF power and five replicates. For convenience, we repeat here the data from Table 3.1: RF Power Observed Etch Rate (A/min) (W) 3 4. 160 575 542 530 539 570 180 565 593 590 579 610 200 600 651 610 637 629 220 725 700 715 685 710 consider = H + H2-H3- H4 test the hypothesis that the contrast I differs significantly from zero. Dr. Asleb Abtahi - Faculty of Mathematics and Statistics islamic Azad University of Shira2 Iran

A First Course in Probability (10th Edition)
A First Course in Probability (10th Edition)
10th Edition
ISBN:9780134753119
Author:Sheldon Ross
Publisher:Sheldon Ross
Chapter1: Combinatorial Analysis
Section: Chapter Questions
Problem 1.1P: a. How many different 7-place license plates are possible if the first 2 places are for letters and...
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EXAMPLE Consider the plasma etching experiment Recall that the engineer is interested in determining if the RF power setting affects the etch rate, and she has run a completely randomized exper- iment with four levels of RF power and five replicates. For convenience, we repeat here the data from Table 3.1: RF Power Observed Etch Rate (A/min) (W) 160 575 542 530 539 570 180 565 593 590 579 610 200 600 651 610 637 629 220 725 700 715 685 710 consider r, = H + H2- H3 - 4 test the hypothesis that the contrast I1 differs significantly from zero. Dr. Asieh Abtahi - Faculty of Mathematics and Statistics Islamic Azad University of Shiraz - Iran
Transcribed Image Text:EXAMPLE Consider the plasma etching experiment Recall that the engineer is interested in determining if the RF power setting affects the etch rate, and she has run a completely randomized exper- iment with four levels of RF power and five replicates. For convenience, we repeat here the data from Table 3.1: RF Power Observed Etch Rate (A/min) (W) 160 575 542 530 539 570 180 565 593 590 579 610 200 600 651 610 637 629 220 725 700 715 685 710 consider r, = H + H2- H3 - 4 test the hypothesis that the contrast I1 differs significantly from zero. Dr. Asieh Abtahi - Faculty of Mathematics and Statistics Islamic Azad University of Shiraz - Iran
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