:) Cutting forces should be kept constant during machining operations to prevent chang in spindle speeds or work position. Such changes would deteriorate the accuracy oft work's dimensions. A control system is proposed to control the cutting force. The pla is difficult to model, since the factors that affect cutting force are time varying and n easily predicted. However, assuming the simplified force control model shown Figure Q2(c). (i) Show the closed-loop transfer function for the system of the system as below K(s+3) T(s) = s* +7s³ +14s? +(8+K)s+3K ii) Determine the range K to keep the system stable using the Routh-Hurwitz criterion. R(s) 1 C(s) K(s+3) s (s + 1)(s+2)(s+4) Figure Q2 (c)

For an electrical component, the formulas for charge and voltage are given here. q(t) =Ae$ vt)-Ce $ B. Your values of A, B, C, and D are given on the Student Values Spreadsheet. A is measured in coulombs, B is measured in seconds, C is measured in volts, and D is measured in seconds. (a) Give the current of this component at time t1, where t1 is measured in seconds and is given on the Student Values Spreadsheet. You must round your answer to the nearest thousandth and give your answer as an integer followed by the appropriate metric prefix and the letter that represents the units of current. (b) Give the power of this component at time t2, where t2 is measured in seconds and is given on the Student Values Spreadsheet. You must round your answer to the nearest thousandth and give your answer as an integer followed by the appropriate metric prefix and the letter that represents the units of power. (C) Give the total energy of this component from time 0 to time t3, where t3 is measured in…

Q8 - You wish to end up with a 2um width metal line (measured at the top of the metal lead cross section). A) You are using an isotropic wet etch process on a 1um thick metal layer. What linewidth should the protective photoresist line be to get these results? Sketch the resulting structure before photoresist strip. B) now you are using a completely anisotropic etch, what is the requisite linewidth of the photoresist to achieve the same end goal? Sketch the resulting structure before the stripping of the photoresist.

From your understanding, what is the differnece between a grounding wire and a grounded wire? I answered this way ... Grounding wire is connecting to ground or to a conductive body extends the ground connections. Whereas the grounded wire is connected to earth or to some conducting body that serves inplace of the earth. The replied I got from a classmate "I feel your definitions here aren't exactly different. The first describes connecting to ground and the second to earth. Those are one and the same. Am I missing your meaning, or do I have that correct?" Is he right or am I really missing the subject? Please reply me soon. Thank you