A magnetic ring has a mean circumference of 20 cm and a cross sectional area of 100 cm² and has 800 number of turns of wire. When the exciting current is 5A, the flux is 2w mWb. The relative permeability of iron is.

Please provide Handwritten answer. 9. After following all the steps in the photolithography, a student found that all the photoresist (the exposed and unexposed photoresist) on the silicon wafer was washed away during the development step. This is due to... * A) the student used longer exposure time during alignment and exposure step B) the student used slower spin speed during spin coating producing thicker photoresists C) the student used longer development time during the development step D) the student used lower temperature and shorter baking time during the pre bake step E) the student misaligned the mask with the wafer during the alignment step 10. After photolithography process the wafer will go to the either etching process or doping process such as ion implantation and diffusion. * True or False