9. PVD is used in the manufacture of items which require thin films for mechanical, optical, chemical or electronic functions. Examples include semiconductor devices such as thin film solar panels, aluminized PET film nitride coated cutting tools for metalworking. If the AHcondensation of the material is 100 kcal/mol, and AHfreezing is 241 kcal/mol, what should be the total energy released in depositing 5 mol of substrate? Silicon the conductivity increases with increasing temperature, however, for tin its decreases though both of them belongs to same group in periodic table. Explain. for food packaging and balloons, and titanium

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9. PVD is used in the manufacture of items which require thin films for mechanical, optical,
chemical or electronic functions. Examples include semiconductor devices such as thin film
solar panels, aluminized PET film for
nitride coated cutting tools for metalworking.
If the AHcondensation of the material is 100 kcal/mol, and AHfreezing is 241 kcal/mol, what should
be the total energy released in depositing 5 mol of substrate?
Silicon the conductivity increases with increasing temperature, however, for tin its decreases
though both of them belongs to same group in periodic table. Explain.
food
packaging and balloons, and titanium
Transcribed Image Text:9. PVD is used in the manufacture of items which require thin films for mechanical, optical, chemical or electronic functions. Examples include semiconductor devices such as thin film solar panels, aluminized PET film for nitride coated cutting tools for metalworking. If the AHcondensation of the material is 100 kcal/mol, and AHfreezing is 241 kcal/mol, what should be the total energy released in depositing 5 mol of substrate? Silicon the conductivity increases with increasing temperature, however, for tin its decreases though both of them belongs to same group in periodic table. Explain. food packaging and balloons, and titanium
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