2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light source with a wavelength of 436nm. What is the minimum feature size you would expect the stepper to be able to produce? What would be the maximum thickness of resist that the stepper could successfully expose?

2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light source with a wavelength of 436nm. What is the minimum feature size you would expect the stepper to be able to produce? What would be the maximum thickness of resist that the stepper could successfully expose?

Elements Of Electromagnetics

7th Edition

ISBN:9780190698614

Author:Sadiku, Matthew N. O.

Publisher:Sadiku, Matthew N. O.

ChapterMA: Math Assessment

Section: Chapter Questions

Problem 1.1MA

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Concept explainers

Conduction and Convection

When energy travels from one object to another it is said to have undergone heat transfer. Heat transfer is nothing but the transfer of thermal energy or internal energy from one thing to another, like e.g., when a vessel with water, kept on top of a burner, heats up because of the flame underneath it.

Question

2. An UV stepper (Exposure Machine) has a NA numerical aperture of 0.3 and uses a light
source with a wavelength of 436nm. What is the minimum feature size you would expect
the stepper to be able to produce? What would be the maximum thickness of resist that the
stepper could successfully expose?

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